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SEM is an advanced imaging instrument that employs electron beams to visualize the surface morphology of specimens with high resolution. By scanning the specimen, SEM generates detailed images, revealing micro- and nano-scale structural features crucial for scientific analysis in fields such as materials science and biology. SEM can be high-resolution imaging, elemental composition, surface analysis, material characterization, and 3D Imaging.

General Methods Description:
Samples were mounted on conductive aluminum stubs and coated with 15 nm of platinum to reduce charging. Imaging was performed using a JEOL JSM-6500F field-emission SEM at 5 kV accelerating voltage and an 18  mm working distance. Secondary electron and backscattered electron signals were collected to examine surface morphology and composition. Elemental analysis was conducted using an Oxford X-Max 50 EDS detector, with spectra and maps acquired under optimized beam conditions (20 kV, 12–15 mm WD). SEM and EDS data were processed using the manufacturer's software with standard background subtraction and peak identification.

Apreo 2 Photo
Apreo 2 SEM

Resources:
Specifications:
Resolution - 0.9 nm at 1 kV
- 0.8 nm at 1 kV (beam decel.)
- 1.0 nm at 1 kV, 10 mm working distance (beam decel.)
- 0.8 nm at 500 V (beam decel.)
- 1.2 nm at 200 V (beam decel.)
Standard Detectors ETD, T1, T2, T3, IR-CCD, Nav-Cam+
PivotBeam Mode for selected area electron channeling (also known as "rocking beam" mode)
Optional Detectors DBS, LVD, STEM 3+, EDS, EBSD
ChemiSEM Technology Live quantitative SEM image coloring is available based on energy dispersive X-ray spectroscopy (EDS). Point & ID, linescan, region, element maps, and reliable Noran quantification are included.
Landing Energy Range 20 eV – 30 keV
Stage Bias (Beam Deceleration) -4000 V to +600 V standard with every system
Low Vacuum Mode Optional: 10 – 500 Pa chamber pressure
Stage 5-axis motorized eucentric stage, 110 x 110 mm2 with a 105° tilt range. Maximum sample weight: 5 kg in un-tilted position.
Maximum Beam Current 50 nA
Standard Sample Holder Multi-purpose holder, uniquely mounts directly onto the stage, hosts up to 18 standard stubs (Ø12 mm), three pre-tilted stubs, cross-section samples and two pre-tilted row-bar holders (38° and 90°) and does not require tools to mount a sample

Zeiss
Zeiss SUPRA 40

Resources:
Specifications:
Nominal Resolution 1.5 nm (at accelerating voltage 10kV)
Accelerating Voltage Max. 30kV
Magnification Range 10X to 500,000X
Attachments EDAX EBSD with OIM software

HitachiTM
Hitachi TM-1000 Table Top SEM

Specifications:
Depth of Focus 0.5mm
Resolution 30nm
Magnification Range 20-10,000X
Sample Size Up to 70mm